1) even lapping
均匀研抛
2) deployment uniformity
抛撒均匀性
1.
The judgement for cluster warhead deployment uniformity of surface to surface tactical missile is outlined.
简述了地地战术导弹集束战斗部抛撒均匀性判定问题 。
3) polishing uniformity
抛光均匀性
4) lapping uniformity
研磨均匀性
1.
Simulation analysis on lapping uniformity of ceramic balls under dual rotating plates lapping mode;
陶瓷球双自转盘研磨方式下研磨均匀性的研究
2.
According to the simulating results, it can be concluded that the effect of offsetting on the lapping uniformity is less.
通过仿真计算发现,在该研磨方式下偏心距对球坯表面研磨均匀性影响较小,并且,各槽内球坯所受研磨均匀性相同。
3.
Therefore internal scholar presented many kinds of lapping modes, and among these modes, rotation angle active control mode owns better lapping uniformity but it is hard to apply to the science for the complexity of structure and control.
为此，国内外学者提出了多种研磨方式，在这些研磨方式中，自转角主动控制研磨方式具有较好的研磨均匀性，然而因其结构和控制复杂，难以应用。
6) polishing
[英]['pɔliʃ] [美]['pɑlɪʃ]
研抛
1.
Study on Elastic Float Polishing In Single Crystal Diamond;
单晶金刚石的弹性浮动研抛技术的研究
2.
Research For Mathematical Model And Its Optimal Technological Parameters On The Polishing Technology;
研抛工艺的数学模型及最优工艺参数研究
3.
Experimental Investigation of the Ultrasonic Vibration Abrasive Tape Polishing;
超声砂带研抛的实验研究
补充资料：研研
1.扬扬自得貌。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条