1) dual beam lasers
双光束脉冲激光沉积
1.
The fundamental approaches and the latest appropriate developments in PLD with ultra fast pulsed laser,pulsed laser arc,and dual beam lasers are discussed in detail.
陈述了其原理、特点、研究方法 ,总结了超快脉冲激光、脉冲激光真空弧、双光束脉冲激光沉积等最新的PLD薄膜制备技术研究进
2) PLD
脉冲激光沉积
1.
Surface Morphology and Photoluminescence Properties of ZnO Films Deposited with PLD;
脉冲激光沉积ZnO薄膜的微结构及发光性能
2.
PLD Preparation and Application of TiNi SMA Thin Film;
TiNi合金薄膜的脉冲激光沉积制备与应用
3.
Microstructures and Properties of Semiconductor Materials with Pulsed Laser Deposition (PLD);
脉冲激光沉积（PLD）半导体材料结构特性的研究
3) pulse laser deposition
脉冲激光沉积
1.
Preparation of single-phase Nd_(1.85)Ce_(0.15)CuO_4 thin films by pulse laser deposition and the laser-induced thermoelectric voltage effect
脉冲激光沉积生长单相的Nd_(1.85)Ce_(0.15)CuO_4薄膜及其激光感生热电电压效应
2.
In order to study the surface emission mechanism of La2O3-Mo cathode,film cathodes were studied by using a set of equipment,specially designed for cathode research,with which film cathode can be prepared by pulse laser deposition.
为了研究镧钼阴极表面发射机制,采用专为研究阴极设计的与俄歇能谱仪相连的脉冲激光沉积装置制备薄膜阴极。
3.
Unhydrogenated diamond-like films were prepared by pulse laser deposition technique at different substrate temperature.
使用脉冲激光沉积技术制备了系列无氢类金刚石薄膜,测量了样品的Raman光谱、光吸收光谱和光致发光光谱,研究了薄膜结构和光致发光性质与制备条件的依赖关系。
4) pulsed laser deposition
脉冲激光沉积法
1.
Recent advances on ZnO-based films synthesized by pulsed laser deposition;
脉冲激光沉积法制备ZnO基薄膜研究进展
2.
The even single phase βFeSi_2 thin films were prepared by femtosecond pulsed laser deposition(PLD) on Si(111) wafers at different temperature using an FeSi_2 alloy target,and excimer(nanosecond) PLD was introduced to prepared β-FeSi_2 thin films also.
用FeSi2合金靶作为靶材,采用准分子激光沉积法在Si(111)单晶基片上制备了单相的-βFeSi2薄膜,并将飞秒脉冲激光沉积法(PLD)引入到-βFeSi2薄膜的制备工艺中;用X射线衍射仪(XRD),场扫描电镜(FSEM),能谱仪(EDS),紫外可见光光谱仪研究了薄膜的结构、组分、表面形貌和光学性能。
3.
5CoO3(LSCO) oxide thin films were realized on SrTiO3(001) substrates by pulsed laser deposition.
利用脉冲激光沉积法在STO(001)基片上外延生长了La0。
5) pulsed laser deposition
脉冲激光沉积
1.
Preparation of BCN thin films by ion beam assisted pulsed laser deposition;
离子束辅助脉冲激光沉积硼碳氮薄膜
2.
Preparation and properties of ITO thin film by pulsed laser deposition;
脉冲激光沉积法制备ITO薄膜及性质研究
3.
The application of pulsed laser deposition in producing bioactive ceramic coating;
脉冲激光沉积技术在制备生物活性陶瓷涂层中的应用
6) Pulsed Laser Deposition(PLD)
脉冲激光沉积(PLD)
1.
Porous silicon(PS) samples with different porosities were prepared by electrochemical anodization method,and ZnS films were deposited on PS substrates by pulsed laser deposition(PLD).
用电化学阳极氧化法制备了不同孔隙率的多孔硅(PS)样品,然后用脉冲激光沉积(PLD)法在其表面生长ZnS薄膜,研究ZnS/PS复合体系的结构和发光特性。
补充资料：双道双光束原子吸收光谱仪
分子式：
CAS号：
性质：又称双道双光束原子吸收分光光度计(dual-channel double-beam atomic absorption spectropho-tometer)，为原子吸收光谱分析用仪器。它有两个光源、两个单色器和两个检测系统，可使两束不同波长的光束(双道)同时通过原子化器，以便同时测定两种元素。双光束是指任一空心阴极灯光源的辐射分为两个光束；其一通过原子化器为测量光束；另一则绕过原子化器为参比光束。
CAS号：
性质：又称双道双光束原子吸收分光光度计(dual-channel double-beam atomic absorption spectropho-tometer)，为原子吸收光谱分析用仪器。它有两个光源、两个单色器和两个检测系统，可使两束不同波长的光束(双道)同时通过原子化器，以便同时测定两种元素。双光束是指任一空心阴极灯光源的辐射分为两个光束；其一通过原子化器为测量光束；另一则绕过原子化器为参比光束。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条