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1)  Intermediate-Basic
中基性
2)  intermediate-basic rock
中-基性岩
3)  neutral radical
中性基团
1.
In this paper are reported the findings of the relative abundance ratio of SiH2radical and SiH3 radical at low pressure and small discharge power by means of the in-stallation of a quadrupole mass spectrometer on the plasma chemical vapor deposition(PCVD) system for performlng in-line probing of neutral radicals in the course of silaneradio-frequency glow discharge while preparing a-Si: H films.
本文报道了采用四极质谱计实现在PCVD系统中对制备a-Si:H薄膜时的硅烷射频辉光放电中性基团的在线测量。
4)  Neutral radicals
中性基团
1.
The experimental results demonstrate that the densities of the neutral radicals have the peak value near the middle position of electrodes, and the densities of SiH_2 and SiH_3 are higher than those of Si and.
SiH_4的消耗率是计算中性基团的关键参量,一种线性拟合的方法被提出来计算SiH_4的消耗率。
5)  neutral monosaccha-rides
中性糖基
6)  neutral radiator
中性基<冶>
补充资料:连续性与非连续性(见间断性与不间断性)


连续性与非连续性(见间断性与不间断性)
continuity and discontinuity

11an父ux泊g四f“山。麻以角g、.连续性与非连续性(c。nt,n琳t:nuity一)_见间断性与不间断性。and diseo红ti-
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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