1) sonochemistry and spark plasma sintering
声化学和放电等离子烧结
2) spark plasma sintering(SPS)
放电等离子烧结
1.
0Cr were prepared by spark plasma sintering(SPS).
0Cr合金粉末为原料,研究了采用放电等离子烧结工艺制备Ti-A l基合金。
2.
The silicon carbide ceramic was prepared by Spark Plasma Sintering(SPS).
本文用放电等离子烧结(SPS)的方法制备了SiC陶瓷,研究了SPS烧结温度、压力和保温时间对烧结试样力学性能的影响。
3.
Using Si3N4-AlN-Al2O3-Y2O3 ceramic system as binding,polycrystalline cubic boron nitride(PcBN) was prepared by spark plasma sintering(SPS).
采用放电等离子烧结工艺(spark plasma sintering,简称SPS)在氮气气氛中制备了以Si3N4-AlN-Al2O3-Y2O3系为基的立方氮化硼聚晶(polycrystalline cubic boron nitride,简称PcBN)。
3) SPS
放电等离子烧结
1.
Heat treatment and magnetic properties of ferromagnetic bulk glassy alloy prepared by SPS;
放电等离子烧结铁磁性大块非晶的晶化处理及其磁性能研究
2.
STUDY ON CARBON POLLUTION AND DECARBONIZATION PROCESS OF SPSED BaTiO_3 CERAMICS;
放电等离子烧结钛酸钡陶瓷的碳污染及脱碳工艺研究
3.
Nd_2Fe_(14)B/α-Fe Nanocomposite Magnets Prepared by Sonochemistry-SPS Process;
超声化学-放电等离子烧结制备Nd_2Fe_(14)B/α-Fe双相复合磁体
4) spark plasma sintering
放电等离子烧结
1.
Influence of sintering parameters on carbonyl iron powder prepared by spark plasma sintering;
烧结参数对羰基铁粉放电等离子烧结的影响
2.
Study on microstructure and oxidation characteristics of TiAl alloy prepared by spark plasma sintering;
放电等离子烧结的钛铝合金组织及氧化性能研究
3.
Microstructure of a bulk nanocrystalline Al-Zn-Mg-Cu alloy prepared by cryomilling and spark plasma sintering;
放电等离子烧结制备Al-Zn-Mg-Cu纳米晶合金的组织
5) spark plasma sintering (SPS)
放电等离子烧结
1.
Study of Dental Materials Prepared by Spark Plasma Sintering (SPS);
放电等离子烧结（SPS）技术制备牙科材料的研究
2.
0Cr were prepared by spark plasma sintering (SPS), and the relationship among sintering temperature, microstructure and mechanical properties was studied.
0Cr合金粉末为原料,采用放电等离子烧结工艺制备出TiAl基合金,并研究了制备工艺、显微组织与室温力学性能三者的关系。
3.
The synthesized powders were sintered by pressureless sintering technique in a graphite furnace with a flowing nitrogen atmosphere and by spark plasma sintering (SPS) technique respectively.
利用低温燃烧合成前驱物制备出平均粒度为100 nm的AlN陶瓷粉末,比较了该粉末的常压烧结和放电等离子烧结的特性。
6) spark plasma sintering (SPS)
放电等离子烧结(SPS)
补充资料：等离子化学气相沉积
分子式：
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条