1) electron cyclotron resonance microwave discharge
电子回旋共振微波放电
2) MW ECR
微波电子回旋共振
1.
The deposition of a-Si∶H films was performed by using microwave electron cyclotron resonance (MW ECR) plasma with the assistance of tungsten filament.
通过红外透射光谱研究了在光诱导退火中退火条件对氢化非晶硅薄膜的结构和光电特性的影响,实验所用样品采用热丝辅助微波电子回旋共振化学气相沉积方法制备。
3) electron cyclotron resonance discharge
电子回旋共振放电
1.
The PIC/MCC simulation of the ionization processes in electron cyclotron resonance discharge(Ⅱ)——Numerical simulation and discussion of results;
电子回旋共振放电的电离特性PIC/MCC模拟(Ⅱ)——数值模拟与结果讨论
2.
The PIC/MCC simulation of the ionization processes in electron cyclotron resonance discharge(Ⅰ)——Physical model and theoretical methods;
电子回旋共振放电的电离特性PIC/MCC模拟(Ⅰ)——物理模型与理论方法
3.
Effect of grid and bias on the characteristic of CHF_3 electron cyclotron resonance discharge plasma;
栅网与偏压对CHF_3电子回旋共振放电等离子体特性的影响
4) MWECR-CVD
微波电子回旋共振等离子体CVD
1.
Recent developments over the past decade in the preparation of a-Si∶H films are reviewed, with emphasis on a new means to increase the deposition rate by microwave electron cyclotron resonance-chemical vapor deposition (MWECR-CVD).
为提高a -Si∶H薄膜的沉积速度 ,还重点介绍了一种新的微波电子回旋共振等离子体CVD(MWECR -CVD)技术 。
6) ECR sputtering method
电子回旋共振微波等离子体溅射
补充资料：电子自旋共振(见电子回旋共振)
电子自旋共振(见电子回旋共振)
electron spin resonance
电子自旋共振eleetron spin resonanee见电子回旋共振。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条