1) photoengraving
[英][,fəutəuin'greiviŋ] [美][,fotoɪn'grevɪŋ]
光刻，光镂
2) photofabrication
[,fəutəu,fæbri'keiʃən]
(1)光加工(2)光镂
3) self-standing transmission gratings
镂空透射光栅
1.
Within the limit of fabricating techniques,2000 l /mm self-standing transmission gratings model was designed.
在满足工艺要求的前提下,通过模拟光栅衍射,设计出镂空透射光栅模型,在此基础上将电子束和X射线光刻技术相结合,研究了制造2000l/mmX射线镂空透射光栅的新工艺技术。
4) lithography
[英][lɪ'θɔɡrəfi] [美][lɪ'θɑgrəfɪ]
光刻
1.
On the development of the study of thick photoresist lithography techniques;
厚层抗蚀剂光刻技术研究进展
2.
Gray-tone lithography for microopto-device of arbitrary 3D shaped surfaces;
任意三维表面微型光器件的灰度光刻技术
3.
Design and assembly of projection lithography lens;
光刻机镜头的结构设计与装配
5) photolithography
[英][,fəutəli'θɔgrəfi] [美][,fotolɪ'θɑgrəfɪ]
光刻
1.
Progress and Development Trend of Photolithography and Photoresist;
光刻与光刻胶的研究与发展
2.
The analysis of figure′s widen and study of its minished in photolithography and etching for thick photoresist;
厚胶光刻蚀刻中的图形展宽分析与改善研究
3.
Research on SU-8 resist photolithography process;
SU-8胶光刻工艺研究
6) Photolithograph
[英][,fəutə'liθəgrɑ:f] [美][,fotə'lɪθə,græf]
光刻
1.
By using the photolithograph and coating technology, the metal mesh film on IR substrate is made, the line width of metallic mesh less than 10μm, the period is about 350μm.
介绍了利用光刻和镀膜技术 ,在红外基片上制作线条宽度小于 10 μm ,周期约 35 0 μm的金属网栅。
2.
The photolithograph of IGCT was introduced.
主要介绍了集成门极换流晶闸管(IGCT)的光刻技术。
补充资料：表光合强度(见光合强度)
表光合强度(见光合强度)
forecast of sowing or transplanting time
b iaoguanghe qiangdu表光合强度见光合强度
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条