1) sedimentation gradient
沉积梯度
2) thermal gradient chemical vapor infiltration
热梯度化学气相沉积
1.
It was illuminated the principle and advantage of thermal gradient chemical vapor infiltration(CVI) technology for preparation of carbon/carbon composites.
阐明了用于制备炭/炭复合材料的热梯度化学气相沉积工艺过程和原理,测定了沉积过程中预成型体内不同位置的温度。
2.
The principles and advantages of thermal gradient chemical vapor infiltration (T-CVI) technology for preparation of carbon/carbon composites are illuminated in this paper.
阐明了热梯度化学气相沉积工艺(CVI)的优越性和用于制备炭/炭复合材料的热梯度化学气相沉积工艺原理;壁冷式热梯度CVI工艺克服了等温化学气相沉积易形成闭孔的缺陷,实现了快速均匀致密化;热梯度CVI工艺设备简单且安全系数高,所制备的炭/炭复合材料密度均匀性好,通过控制工艺参数,利用热梯度CVI工艺可以制备不同微观组织结构的热解炭。
3.
In order to illuminate the principle of thermal gradient chemical vapor infiltration (TCVI) technology for preparation of carbon/carbon composites, the change of resistance and power as a function of deposition re-gimes was measured and discussed in this paper.
为了阐明用于制备炭/炭复合材料的热梯度化学气相沉积工艺原理,分析了沉积过程中随着热解沉积区域的移动,发热体的电阻值以及加在发热体两端功率的变化规律,并利用偏光显微镜观察了材料的粗糙层、光滑层热解炭微观组织结构。
3) gradient precipitation
梯度沉淀
1.
The concentrated solution was treated by gradient precipitation.
用含水甲醇对油茶饼进行浸提、过滤和浓缩处理后,将其浓缩液继续进行梯度沉淀,并对梯度沉淀提取物进行定性研究和清除DPPH。
4) subsidence g radient
下沉梯度
5) deposition rate
沉积速度
1.
Effect of electroless nickel plating process for aluminium alloy on deposition rate of the coating;
铝合金化学镀镍工艺对镀层沉积速度的影响
2.
Discussion on the factors affecting the deposition rate of electroless Ni-Cu-P alloy on ABS plastics;
影响ABS塑料化学镀Ni-Cu-P合金沉积速度的因素探讨
3.
Effects of citric acid on electroless Ni-P alloy deposition rate and properties;
柠檬酸对Ni-P合金化学镀沉积速度和镀层性能的影响
6) deposition temperature
沉积温度
1.
Influence of deposition temperature on the structure and thermal stability of a-C: F films;
沉积温度对a-C:F薄膜结构与热稳定性的影响
2.
Influences of deposition temperature and rate on mechanical stress of electron beam deposited ZnSe thin films
沉积温度和速率对电子束沉积ZnSe薄膜应力特性的影响
3.
MoS2-Ti composite coatings were deposited by unbalanced magnetron sputtering system,the effects of deposition temperature on the structure and mechanical performance of coating were studied.
采用非平衡磁控溅射沉积技术制备MoS2-Ti复合薄膜,研究了沉积温度对薄膜的结构和性能的影响。
补充资料：等离子化学气相沉积
分子式：
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条