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1)  Polishing effect
抛光效应
2)  anchoring [英]['æŋkə]  [美]['æŋkɚ]
抛锚效应
3)  removal efficiency
抛光效率
1.
Compared the surface roughness and removal efficiency with the diversity magnetic field intensity,proceed magnetorheological finishing,combined magnetic field intensity is used to polish the material of K9 flat glass of roughness(Ra) 400 nm f.
比较了不同磁场强度下的磁流变抛光情况,以及表面粗糙度和抛光效率的差别,然后,通过采用不同磁场强度组合加工,使初始表面粗糙度(Ra)为400 nm的K9玻璃材料的平面,磁流变抛光30 min,表面粗糙度值达到了0。
4)  polishing efficiency
抛光效率
1.
The result indicated that there were several factors that influence the polishing efficiency,including grind granule,positive pressure and rotate speed.
通过对机械抛光后的YAG表面进行了研究,结果表明:合理优化工艺参数,可获得较好的面形和较低的粗糙度,影响抛光效率的因素为磨粒、正压力和转速。
2.
The effect of the controllable polishing parameters such as electrical potential, polishing clearance and polishing time on the polishing efficiency is discussed as well.
本文介绍了电泳抛光技术在功能陶瓷表面加工中的应用,并在自行改装的电泳抛光机上对半导体硅板进行了抛光试验,获得了电压、抛光间隙、抛光时间对抛光效率的影响规律,为电泳抛光技术的深入应用奠定了基础。
5)  Back CMP cleaning
无应力抛光
6)  polyester polishing
聚氨脂高效抛光
补充资料:抛光剂,抛光混合剂
CAS:68909-13-7
中文名称:焙烧提浓的氟碳铈镧矿;抛光剂,抛光混合剂
英文名称:Bastnaesite, calcined concentrate;Calcined bastnasite;bastnaesite, calcined conc.;polishing compound;Bastnaesite,calcined concentrate
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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