1) Gate Oxide Process
栅氧化工艺
2) DGO
双栅氧工艺
3) oxidation process
氧化工艺
1.
Development trend of PX oxidation process;
PX氧化工艺的发展方向
2.
Following the introduction of two methods for NH3/air ratio control in nitric acid production with oxidation process,by flow and by ratio,the author compared the differences between the methods in parameter indication,control method and system performance,which turned out the method with ratio control was more suitable.
对稀硝装置氧化工艺氨-空比值控制系统的2种控制方案——流量控制方案和比值控制方案分别作了介绍。
4) oxidation processing
氧化工艺
1.
This paper indicates that applying the professional knowledge to real research programs is propitious to improve students comprehensive qualities during undergraduate thesis working through studying the influence of oxidation processing on microstructure and properties of TiN films deposited by vacuum.
文章通过氧化工艺对真空电弧沉积TiN薄膜组织与性能的影响这一课题研究 ,指出在毕业论文的工作中 ,将专业知识运用到实际课题的研究中 ,有利于提高学生的综合素
2.
The influence of oxidation processing on microstructure and properties of TiN films deposited by vacuum arc was studied .
研究了各种氧化工艺对真空电弧沉积 Ti N薄膜组织与性能的影响。
补充资料：2,2'-[1,4-亚苯基双(氧甲烯)]双环氧乙烷
CAS：2425-01-6
分子式：C12H14O4
中文名称：2,2'-[1,4-亚苯基双(氧甲烯)]双环氧乙烷
英文名称：2,2'-[1,4-phenylenebis(oxymethylene)]bis-Oxirane
Hydroquinone 1,4-diglycidyl ether
分子式：C12H14O4
中文名称：2,2'-[1,4-亚苯基双(氧甲烯)]双环氧乙烷
英文名称：2,2'-[1,4-phenylenebis(oxymethylene)]bis-Oxirane
Hydroquinone 1,4-diglycidyl ether
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条