1.
plasma activated chemical vapour deposition
等离子体化学气相沉积
2.
plasma chemical vapor deposition
等离子体化学汽相淀积
3.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
4.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
5.
Study of Ammonia Synthesis by Means of High Pressure Non-equilibrium Plasma Chemistry;
高气压非平衡等离子体化学合成氨的研究
6.
Investigation of Plasma Chemistry in the Deposition of F-doped SiCOH Films;
氟掺杂SiCOH薄膜沉积的等离子体化学特性研究
7.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
8.
Filming-Technology of Plasma Chemistry in Powder Metallurgy Products
等离子体化学镀膜技术在粉末冶金行业的应用
9.
plasma astrophysics
等离子体天体物理学
10.
The Dynamics Simulation of Ions Striking an Inner Hemispherical Bowl-shaped in Plasma Source Ion Implantation
等离子体源离子注入过程中离子动力学演化数值模拟
11.
gas plasma oxidizer
气体等离子氧化装置
12.
physics of high temperature plasma
高温等离子体物理学
13.
plasma and high energy physics
等离子体和高能物理学
14.
high temperature plasma dynamics
高温等离子体动力学
15.
theoretical plasma physics
理论等离子体物理学
16.
space plasma physics
空间等离子体物理学
17.
physics of hot plasma in the magnetosphere
磁层热等离子体物理学
18.
The Physicochemical Mechanism of Modified Solid Surface of Cold Plasma;
冷等离子体固体表面改性的物理化学机理