1.
Co-precipitation of nano-crystalline corrosion products on hot dip Zn-Al alloy coating
热浸锌铝合金镀层表面纳米晶腐蚀产物共沉积机理
2.
Properties, Structure and Codeposition Mechanism of Ni/nano-Powder Composite Coating Prepared by Electro-Brush Plating;
电刷镀镍基含纳米粉复合镀层性能、结构和共沉积机理
3.
The Current Status and Evolution of Abnormal Co-deposition Mechanisms in Zn-based Alloy;
锌基合金异常共沉积的机理研究现状
4.
Study on Mechanisms of Atrazine Adsorption onto Surficial Sediments and Their Main Components with Cu~(2+) Present;
表层沉积物及其主要组分对共存Cu~（2+）与阿特拉津吸附的机理研究
5.
MECHANISM AND KINETICS OF ELECTROPHORETIC DEPOSITION (EPD) OF YTTRIA-STABILIZED ZIRCONIA (YSZ) FILM
电泳沉积法制备固体电解质薄膜的沉积速率和沉积机理
6.
Research on Electroplating Techonology and Mechanism of Sn-Ag-Cu Alloy Coatings;
电沉积Sn-Ag-Cu合金工艺及沉积机理研究
7.
Simulation of Micro EDM Deposition in Gas and Research on Its Mechanics;
气中微细电火花沉积仿真与机理研究
8.
Influence of Inhibitors on Calcium s Precipitation and Related Mechanism;
阻垢剂对钙离子沉积的影响及其机理
9.
The Influence of H_2 Evolution to Mechanism of Zn-Ni Electrodeposition;
析氢对Zn-Ni电沉积机理的影响
10.
Regularity and Mechanism of Pb Electrodeposition Intensified by Super Gravity Field
超重力场强化铅电沉积的规律与机理
11.
Preparation and Characterization of the HA/Collagen Composite Coating and Its Formation Mechanism;
羟基磷灰石/胶原复合涂层的共沉积制备、表征及孔状结构的形成机理研究
12.
Preparation of Pulse Electrodeposited Copper and Nickel Nano Multilayer and Primary Exploration of Its Deposition Mechanism
铜/镍纳米多层膜脉冲电沉积法制备及沉积机理初探
13.
Research on the Physiological Functions and Deposition Mechanisms of Silicon in Rice;
水稻体内硅的生理功能及沉积机理的研究
14.
Physical Vapor Growth of Pentacene Thin Films and It s Growth Mechanism;
物理汽相沉积并五苯半导体薄膜及其生长机理
15.
Study on Process, Mechanism and Application of Electrodeposited Zn-Fe-SiO_2 Composite Coatings;
电沉积Zn-Fe-SiO_2复合镀层工艺、机理及应用研究
16.
Deposition and Growth Mechanism of Crystalline Carbon Nitride Thin Films;
晶态氮化碳薄膜沉积及其生长机理研究
17.
Reformation Machenism and Features of Dynamic Sediment in Flood Channels of the Changjiang Estuary;
长江河口涨潮槽的形成机理与动力沉积特征
18.
Studies on Properties and Mechanism of Silicon-Based Films Deposited by CVD;
化学气相沉积硅基薄膜的性能及机理研究