1.
Study on the Microstructure of Microcrystalline Silicon Thin Films by VHF-PECVD
VHF-PECVD制备微晶硅薄膜的微结构研究
2.
Influence of boron on the properties of intrinsic microcrystalline silicon thin films
硼对沉积本征微晶硅薄膜特性的影响
3.
An optical emission spectroscopy study on the high rate growth of microcrystalline silicon films
高速沉积微晶硅薄膜光发射谱的研究
4.
Fabrication of the Microcrystalline Silicon Materials and Solar Cells by PECVD;
PECVD法制备微晶硅薄膜材料及太阳能电池
5.
Investigation on Activation Energy of Intrinsic Microcrystalline Silicon Thin Films Deposited by VHF-PECVD
VHF-PECVD沉积本征微晶硅薄膜激活能特性研究
6.
High rate growth and electronic property of μc-Si∶H
微晶硅薄膜高速沉积及电学性质的研究
7.
Optimized Growth Conditions and High Deposition Rate of μc-Si∶H Films
氢化微晶硅薄膜的两因素优化及高速沉积
8.
Single-chamber deposition of intrinsic microcrystalline silicon thin film and its application in solar cells
单室沉积本征微晶硅薄膜及其在电池中的应用
9.
Influence of Hydrogen on Microcrystalline Silicon Thin Film in Low Temperature Deposition and Annealling Process
氢在微晶硅薄膜低温沉积及退火过程中的影响
10.
Effects of Drift Due to Chamber's Long-time Usage on Microcrystalline Silicon Properties
腔室长时间使用造成的工艺漂移对微晶硅薄膜性质的影响
11.
Effects of hydrogen plasma pretreatment of substrate on the growth of microcrystalline silicon film
衬底H等离子体预处理时间对微晶硅薄膜生长的影响
12.
A spectroscopic ellipsometry study of the abnormal scaling behavior of high-rate-deposited microcrystalline silicon films by VHF-PECVD technique
椭圆偏振技术研究VHF-PECVD高速沉积微晶硅薄膜的异常标度行为
13.
Study of a-Si:H Microstructure by MWECR CVD Technique;
MWECR CVD制备氢化非晶硅薄膜的微结构研究
14.
Influence of Substrate Temperature on the Growth of μc-SiGe Thin Film
衬底温度对氢化微晶硅锗薄膜生长的影响
15.
Fabrication of P-type Amorphous Silicon Thin Films and Poly-Silicom by PECVD;
PECVD法制备P型非晶硅薄膜及多晶硅薄膜
16.
Metal-Induced Crystallization of Amorphous Silicon and Silicon Germanium Films
非晶硅和非晶硅锗薄膜的金属诱导结晶
17.
Preparation of Poly-Silicon Thin Film in Low Temperature Using SiH_4 as Gas Source by ECR-PECVD;
以硅烷为气源用ECR-PECVD制备多晶硅薄膜
18.
The Effect of Crystallization Ratio on Dark Conductivity of Poly-Silicon Thin Films;
多晶硅薄膜晶化率对暗电导率的影响