1.
The Studies of Thin Crystalline Silicon Solar Cells and Electrode System;
薄晶体硅太阳电池及其电极系统的研究
2.
Study of High Image Quality Amorphous-Silicon Thin Film Transistor Liquid Crystal Displays
高像质非晶硅薄膜晶体管液晶显示器的研究
3.
Process Research on PECVD SiN-x:H Film for Crystalline Silicon Solar Cells
晶体硅太阳能电池PECVD SiNx:H薄膜工艺研究
4.
The Effects of Active Layer Thickness on the Characteristics of Amorphous Silicon Thin Film Transistors
有源层厚度对非晶硅薄膜晶体管特性的影响
5.
A Research on Driving Module of Poly-Si TFT OLED;
多晶硅薄膜晶体管有机发光显示模块的研制
6.
Study and Simulation on Reliability of Poly-Si Thin Film Transistor;
多晶硅薄膜晶体管可靠性研究及其模拟
7.
Design of Construct Parameters of High Image Quality a-Si TFT LCD;
高像质非晶硅薄膜晶体管结构参数的设计
8.
Modeling of the Band-to-Band Tunneling Current in Polysilicon TFT's Leakage Region
多晶硅薄膜晶体管泄漏区带间隧穿电流的建模
9.
Study on Low Temperature Preparation and Optical Properties of Crystalline Silicon Thin Films
晶体硅薄膜的低温制备技术及其性能研究
10.
Fabrication of LTPS TFT with High Qualities and Design for Integration of Peripheral Drive Circuits;
高品质低温多晶硅薄膜晶体管的制作与周边一体化设计
11.
Silicon Nitride Film Transfer Technology and Fabrication of One Dimensional Photonic Crystal Based on Porous Silicon;
氮化硅薄膜转移技术与多孔硅基一维光子晶体制备研究
12.
Fabrication of P-type Amorphous Silicon Thin Films and Poly-Silicom by PECVD;
PECVD法制备P型非晶硅薄膜及多晶硅薄膜
13.
Finite Element Analysis of TSOP Failure during Mould Release and Temperature Distribution in Polysilicon TFT under Self-heating Stress;
TSOP失效和多晶硅薄膜晶体管自加热效应的有限元分析和模拟
14.
Study on the Simulation Technique in Self-heating Effect and KNIK Effect of Thin Film Transistors;
多晶硅薄膜晶体管自加热效应和KINK效应的模拟技术研究
15.
Influence of Hydrogen Flow on Grain Size of Nano-Crystalline Sic Films Grown by HFCVD Method
HFCVD法制备纳米晶体碳化硅薄膜中氢流量对晶粒尺寸的影响
16.
Numerical Simulation of Unsaturated Output Current of Amorphous-Silicon Thin-Film Transistors
非晶硅薄膜晶体管中不饱和输出电流的数值仿真
17.
Metal-Induced Crystallization of Amorphous Silicon and Silicon Germanium Films
非晶硅和非晶硅锗薄膜的金属诱导结晶
18.
Preparation of Poly-Silicon Thin Film in Low Temperature Using SiH_4 as Gas Source by ECR-PECVD;
以硅烷为气源用ECR-PECVD制备多晶硅薄膜