1.
Effects of Sputtering Parameters on Optical Constant of NiO_x Thin Films
磁控溅射参数对NiO_x薄膜光学常数的影响(英文)
2.
Study on the Effect of Magnetron Parameters on Deposition Rates, Microstructure and Properties in Cr-Containing Graphite-Like Carbon Coatings;
磁控溅射参数对含铬类石墨碳膜沉积速率、组织与性能影响的研究
3.
The results show that the sputtering power significantly affects the compactness of the A1 film.
初步探讨了溅射功率、气压和时间等不同溅射参数对铝层结构和铝层在氟塑料表面附着情况的影响。
4.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
5.
Effect of sputtering parameters on texture of Cu films
磁控溅射工艺参数对Cu薄膜织构的影响
6.
Effect of Process Parameters on the Deposition of DC Magnetron Sputtered Films
工艺参数对直流磁控溅射膜沉积的影响
7.
Deposition of Al Oxide-Doped ZnO Films on Substrates of Polythylene Terephthalate Nonwovens
PET纤维基AZO透明导电薄膜溅射工艺参数的优化
8.
Influence of operating parameters on discharge characteristics of planar DC magnetron
工作参数对平面直流磁控溅射放电特性的影响
9.
Influence of Operation Conditions on Deposition Rate of Planar DC Magnetron Sputtering
工作参数对平面磁控溅射系统沉积速率的影响
10.
Plasma emission diagnostics for the optimization of deposition parameters in RF magnetron sputtering of GaP film
等离子体发射光谱诊断用于射频磁控溅射GaP薄膜的工艺参数优化
11.
Influence of Technological Parameters on Binding Ability of Stainless Steel Film by Magnetron Sputtering
磁控溅射工艺参数对不锈钢薄膜结合性能的影响
12.
The Craft Study on Color of ZrN Decorative Coating by Mid-Frequency Reactive Magnetron Sputtering;
中频反应磁控溅射制备氮化锆薄膜及颜色制备工艺参数研究
13.
Study on the Effects of Magenetron Sputtering Deposition Parameters to the Integrated Tribological Properties of DLC Films
磁控溅射工艺参数对DLC膜的综合摩擦学性能影响研究
14.
Influence of Craft Parameters on Surface Morphology and Microstructure of NdFeB Thin Films
磁控溅射工艺参数对NdFeB薄膜表面形貌及相结构的影响
15.
Effects of deposition parameters on deposition rate of B-C-N film prepared by magnetron sputtering
磁控溅射沉积参数对硼碳氮薄膜沉积速率的影响
16.
Effect of Process Parameters on the Adhesion of Magnetron Sputtered Copper and Aluminum Coatings on Gadolinium Substrate
磁控溅射工艺参数对Cu,Al薄膜与Gd基底附着性的影响
17.
Effect of Technological parameters on deposition rate of ZAO films prepared by DC magnetron reactive sputtering
工艺参数对直流反应磁控溅射ZnO:Al薄膜沉积速率的影响
18.
the emitting positions of the sputtered atoms are close to the corresponding incident ions (in the order of angstrom);
溅射原子的出射位置就在离子入射位置的附近(埃数量级);