1.
Hard surface photomask substrates
GB/T15871-1995硬面光掩模基板
2.
Specification for round quartz photomask substrates
GB/T16523-1996圆形石英玻璃光掩模基板规范
3.
Chrome thin films for hard surface photomasks
GB/T15870-1995硬面光掩模用铬薄膜
4.
Specification for registration marks for photomasks
GB/T16524-1996光掩模对准标记规范
5.
Experimental Research on Photomask Repair System Using Laser Induced Chemical Vapor Deposition(LCVD) Method;
激光化学气相沉积光掩模版修复系统的研究
6.
Guidelines for photomask defect classification and size definition
GB/T16880-1997光掩模缺陷分类和尺寸定义的准则
7.
Study of Competition Strategy for Toppan Photomask Company LTD, Shanghai;
上海凸版光掩模有限公司竞争战略研究
8.
photoresist mask pattern
光致抗蚀剂掩模图形
9.
electron chrome mask
电子束光刻用铬掩模
10.
Improving the Profiles of Imaging Patterns by Optimizing Mask in DMD-Based Maskless Photolithography
优化掩模分布改善数字光刻图形轮廓
11.
PRINCIPLE AND DESIGN OF PHASEMASK USED AS INSCRIBING STEP CHIRPED FIBER GRATING
用于步进啁啾光纤光栅的掩模板原理和设计
12.
Optical Fiber Bragg Grating Sensor by Phase Mask Method
采用掩模板制作的光纤布喇格光栅传感器
13.
Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;
光刻胶全息光栅掩模槽形的控制和检测
14.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
15.
Study on a new method for control the profile of chivped phase mask
啁啾光纤光栅相位掩模槽形控制新方法研究
16.
Laser repair techuipue fos Lsi photomasrs
大规模集成电路掩模缺陷激光修正技术
17.
Research on Gray-Scale Mask Fabrication and Application Technique of Micro Optics Element;
微光学器件灰度掩模制作及应用技术的研究
18.
Profile Control and Detection of Multi-layer Dielectric Grating Masks;
多层介质膜光栅掩模槽形的控制与检测