1.
The principle and the main parameters of the dry etching for silicon dioxide are introduced.
阐述了二氧化矽干法蚀刻的原理和主要的蚀刻参数。
2.
Parameter Optimization Based on High-Aspect Ratio Si Dry Etching
基于高深宽比Si干法刻蚀参数优化
3.
PROCESS PARAMETERS DETERMINATION OF ETCHING LITHOGRAPHY SERVO DISK BY HF SPUTTERING
利用高频溅射刻蚀光刻伺服盘工艺参数的确定
4.
Plasma Etching and Parameters Optimizing for Flexible PI Substrate to Produce Flying Lead
等离子蚀刻挠性PI基材制作悬空引线及其参数优化
5.
etchings, woodcuts, lithographs;
蚀刻、木刻、平版画；
6.
NUMERICAL STUDIES ON ETCH PROFILES IN HIGH-DENSITY PLASMA;
高密度等离子体刻蚀轮廓的数值研究
7.
Bayes Estimator of the Parameter in a Subclass of the Scale-exponential Family
一类刻度指数分布族参数的Bayes估计
8.
The empirical Bayes test of the parameter for the scale-exponential family under PA samples
PA样本下刻度指数族参数的EB检验
9.
Application of characteristic parameters of karst and fracture of buried hill carbonate rock
潜山灰岩溶蚀和裂缝的特征参数应用
10.
Study on Differential Curve Parameters of the Inhibitor Adsorption
缓蚀剂吸附的微分极化曲线参数研究
11.
Design of assessment parameters for performance of anti-sulfate erosion of GHPC
GHPC抗硫酸盐腐蚀性的评价参数设计
12.
gas discharge etching
气体放电蚀刻[法]
13.
laser engraving, laser etching
激光雕刻，激光蚀刻
14.
a block that has been etched or engraved.
一块被蚀刻或雕刻的板。
15.
Nonparametric Depiction of China s Price Adjustment Curve:1980-2006;
中国价格调整曲线的非参数刻画:1980-2006
16.
The Optimization of the Photolithography Process for 0.35um BiCMOS Product
0.35微米BiCMOS光刻工艺参数的优化
17.
The Empirical Bayes Estimator of the Scale Parameter for the Two-parameter Exponential Distribution on the Basis of Type-II Truncated Sample
定数截尾试验下双参数指数分布刻度参数的经验Bayes估计
18.
To cut into the surface of(glass, for example) by the action of acid.
蚀刻用酸蚀刻（玻璃的）表面