1.
variable shaped electron beam exposure system
可变电子束曝光装置
2.
The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
3.
The E-beam Lithograpy Control System Based on VC++6.0
基于VC++6.0的电子束曝光控制系统
4.
Study of Pattern Generator for Nanometer E-beam Lithography System;
纳米级电子束曝光系统用图形发生器技术研究
5.
Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;
纳米级电子束曝光机聚焦偏转系统的研究
6.
E-beam Lithography Stage Controller Design Based on FPGA
基于FPGA的电子束曝光机工件台控制器设计
7.
Measurement System of Precision Stage for E-Beam Aligner
电子束曝光系统中精密工件台的测量系统
8.
Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;
扫描电子束曝光机背散射电子检测与对准技术的研究
9.
APPLICATION OF PHASE-LOVKED METHOD IN CONSTANT SPEED CONTROL OF STAGE OF EB EXPOSURE MACHINE
锁相技术在电子束曝光机工件台稳速控制中的应用
10.
The Research and Development of the Utility Program about Graphic Data Conversion for E-beam Lighography System;
可变矩形电子束曝光机图形数据转换软件的实用化研制
11.
The composition,principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced.
本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；
12.
electron beam projection exposure apparatus
电子束投影曝光装置
13.
Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning
电子束重复曝光加工PCR微通道的工艺研究
14.
The Research of Mark Signal Detection and Alignment Technology Used in High-energy Projection Electron Beam Lithography System with Demagnification Imaging (PELDI);
高能电子束缩小投影曝光机标记信号检测及对准技术的研究
15.
raster scan electron beam lithography
光栅扫描电子束光刻
16.
cinematographic film,sensitized bu no exposed
未曝光的感光电影胶片
17.
cinematographic film, sensitized, unexposed
感光电影胶片,未曝光
18.
vector scan electron beam lithography
矢量扫描电子束光刻