1.
Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;
扫描电子束曝光机背散射电子检测与对准技术的研究
2.
raster scan electron beam lithography
光栅扫描电子束光刻
3.
vector scan electron beam lithography
矢量扫描电子束光刻
4.
The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
5.
raster scan electron beam system
光栅扫描电子束光刻系统
6.
variable shaped electron beam exposure system
可变电子束曝光装置
7.
electron beam projection exposure apparatus
电子束投影曝光装置
8.
blue deflectinggenerator
蓝电子束扫描发生器
9.
electron-beam film scanning
胶片电子束扫描录像
10.
electronically scanned stacked beam radar
电子扫描迭加波束雷达
11.
vector scan electron beam system
矢量扫描电子束装置
12.
modular optoelectronic multispectral scanner
可调光电子多光谱扫描机
13.
Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;
纳米级电子束曝光机聚焦偏转系统的研究
14.
E-beam Lithography Stage Controller Design Based on FPGA
基于FPGA的电子束曝光机工件台控制器设计
15.
electronically scanned optical tracker
电子扫描光学跟踪装置
16.
Design of Optical System on All Bands CCD MSS on EROS
星载电子扫描式多光谱扫描仪光学系统设计
17.
The E-beam Lithograpy Control System Based on VC++6.0
基于VC++6.0的电子束曝光控制系统
18.
Electonic plate scanning: A process that uses a light beam to scan the offset plate for the purpose of recording the position of image areas on the plate and to evaluate the amount of ink required .
电子印版扫描:用光束扫描柯式印版的过程中，记录印版上的印纹位置，用以计算需用墨量。