1.
Influence of boron on the properties of intrinsic microcrystalline silicon thin films
硼对沉积本征微晶硅薄膜特性的影响
2.
Investigation on Activation Energy of Intrinsic Microcrystalline Silicon Thin Films Deposited by VHF-PECVD
VHF-PECVD沉积本征微晶硅薄膜激活能特性研究
3.
Single-chamber deposition of intrinsic microcrystalline silicon thin film and its application in solar cells
单室沉积本征微晶硅薄膜及其在电池中的应用
4.
Study on the Microstructure of Microcrystalline Silicon Thin Films by VHF-PECVD
VHF-PECVD制备微晶硅薄膜的微结构研究
5.
An optical emission spectroscopy study on the high rate growth of microcrystalline silicon films
高速沉积微晶硅薄膜光发射谱的研究
6.
Study on Intrinsic/B-doped na-Si:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition;
PECVD法制备本征/掺硼纳米非晶硅薄膜及其性能研究
7.
Study of a-Si:H Microstructure by MWECR CVD Technique;
MWECR CVD制备氢化非晶硅薄膜的微结构研究
8.
Fabrication of the Microcrystalline Silicon Materials and Solar Cells by PECVD;
PECVD法制备微晶硅薄膜材料及太阳能电池
9.
High rate growth and electronic property of μc-Si∶H
微晶硅薄膜高速沉积及电学性质的研究
10.
Optimized Growth Conditions and High Deposition Rate of μc-Si∶H Films
氢化微晶硅薄膜的两因素优化及高速沉积
11.
Influence of Substrate Temperature on the Growth of μc-SiGe Thin Film
衬底温度对氢化微晶硅锗薄膜生长的影响
12.
Influence of Hydrogen on Microcrystalline Silicon Thin Film in Low Temperature Deposition and Annealling Process
氢在微晶硅薄膜低温沉积及退火过程中的影响
13.
Fabrication of P-type Amorphous Silicon Thin Films and Poly-Silicom by PECVD;
PECVD法制备P型非晶硅薄膜及多晶硅薄膜
14.
Metal-Induced Crystallization of Amorphous Silicon and Silicon Germanium Films
非晶硅和非晶硅锗薄膜的金属诱导结晶
15.
Preparation of Poly-Silicon Thin Film in Low Temperature Using SiH_4 as Gas Source by ECR-PECVD;
以硅烷为气源用ECR-PECVD制备多晶硅薄膜
16.
The Effect of Crystallization Ratio on Dark Conductivity of Poly-Silicon Thin Films;
多晶硅薄膜晶化率对暗电导率的影响
17.
Structural Evolution and Properties of Amorphous Silicon-Carbon Thin Films Deposited by Micro-wave Electron Cyclotron Resonance Plasma;
微波电子回旋共振法沉积的非晶碳化硅薄膜结构和性能研究
18.
Studies of a-Si:H Microstructure by Hot Wire Assisted Mwecr CVD Technique;
热丝辅助MWECR CVD制备氢化非晶硅薄膜的微结构研究