1.
Structural properties of nanocrystalline silicon films depositee by helicon wave enhanced chemical vapor deposition
螺旋波等离子体沉积纳米硅薄膜结构特性
2.
Investigation on ECR Plasma Deposition and Dielectric Property of SiCOH Low-k Films;
SiCOH低k薄膜的ECR等离子体沉积与介电性能研究
3.
SiO_x-like coating on cotton fabric by atmospheric pressure plasma
大气压等离子体沉积棉织物类氧化硅薄膜(英文)
4.
plasma activated chemical vapour deposition
等离子体化学气相沉积
5.
depositing plasma
沉积性等离子体（表面改性的主要工艺）
6.
Ultra-thin C-N-Si Protective Films Prepared by Plasma Enhanced Deposition;
等离子体增强沉积C-N-Si超薄保护膜
7.
Deposition of orthorhombic boron nitride films by plasma-enhanced pulsed laser deposition
等离子体增强脉冲激光沉积o-BN薄膜
8.
Latest Progress of Plasma Immersion Ion Implantation and Deposition and Its Applications
等离子体浸没式离子注入沉积技术及应用
9.
Prepared TiN Thin Films by LTP Enhanced Electronic Beam Evaporation;
低温等离子体增强电子束蒸发沉积TiN的研究
10.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
11.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
12.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
13.
Investigation of Plasma Chemistry in the Deposition of F-doped SiCOH Films;
氟掺杂SiCOH薄膜沉积的等离子体化学特性研究
14.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
15.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
16.
Modification of silk fabric via atmospheric pressure plasma liquid deposition
丝织物的大气压等离子体液相沉积处理
17.
IR Antireflection Coatings on Ge Deposited by APS IAD
应用等离子体离子辅助技术沉积的锗基底红外减反射膜
18.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析