1.
variable shaped electron beam exposure system
可变电子束曝光装置
2.
electron beam projection exposure apparatus
电子束投影曝光装置
3.
The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.
可变矩形电子束曝光机的基本曝光图形是矩形。
4.
direct write electron beam system
直写式电子束光刻装置
5.
The Research and Development of the Utility Program about Graphic Data Conversion for E-beam Lighography System;
可变矩形电子束曝光机图形数据转换软件的实用化研制
6.
The E-beam Lithograpy Control System Based on VC++6.0
基于VC++6.0的电子束曝光控制系统
7.
Study on the Reliability of SG-Ⅲ Inertial Confinement Fusion Laser Driver;
神光Ⅲ惯性约束聚变激光装置可靠性研究
8.
A device for converting heterogeneous beam of radiation (elec tromagnetic or particulate) to homogeneous beam by absorption or refraction of unwanted components.
利用吸收或折射掉不需要的成分,把非单色光束(电磁的或粒子的)变成单色光束的装置。
9.
reduction aligner
收缩式投影曝光装置
10.
uv proximity printer
紫外线接近式曝光装置
11.
one to one projection system
一比一投影曝光装置
12.
vacuum contact printer
真空接触式曝光装置
13.
projection stepper
步进式投影曝光装置
14.
x ray align and exposure equipment
x 射线对准曝光装置
15.
vector scan electron beam system
矢量扫描电子束装置
16.
Study of Pattern Generator for Nanometer E-beam Lithography System;
纳米级电子束曝光系统用图形发生器技术研究
17.
Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;
纳米级电子束曝光机聚焦偏转系统的研究
18.
E-beam Lithography Stage Controller Design Based on FPGA
基于FPGA的电子束曝光机工件台控制器设计