1) chemical vapor reaction
化学气相反应
1.
In order to improve the adhesion strength of Zr-Si-C coating,Zr-Si-C coating was prepared on SiC ceramic using a new chemical vapor reaction method,and based on a powder immersion reaction assisted coating process.
为了提高Zr-Si-C涂层与基体的结合强度,基于粉末埋入反应辅助涂覆工艺,采用新型化学气相反应法在SiC陶瓷表面制备Zr-Si-C涂层。
2.
SiC coatings were fabricated by chemical vapor reaction (CVR) on HTR fuel element matrix graphite, and the structure characteristics of SiC coatings were analyzed with XRD, Raman spectra and SEM.
本文对利用化学气相反应法(CVR)在高温气冷堆燃料元件基体石墨上制备SiC涂层的工艺进行了探讨,利用XRD、Raman谱及SEM对制备的SiC涂层进行了分析。
3.
High-yield silicon carbide (SiC) nanowires had been synthesized without the presence of catalyst by using Si, SiO_2 and graphite powder as the raw materials at 1400℃,during which the course of a complex chemical vapor reaction technique was applied.
用硅粉、二氧化硅和石墨粉作原料,在无催化剂的条件下,在1400℃下用高温化学气相反应法制备了碳化硅纳米线,并用高分辨扫描电镜观察了所得碳化硅纳米线的形貌。
2) gas-phase chemical reaction
气相化学反应
3) catalytic chemical vapor reactions
化学气相催化反应
4) chemical vapor deposition reactor
化学气相沉积反应器
5) Isopiestic gas-phase chemicalreactions
等压气相化学反应
6) chemical vapour growth of thin film
化学气相反应生长薄膜
补充资料：等离子化学气相沉积
分子式：
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
CAS号：
性质：PCVD 化学气相沉积(CVD)法是制备无机材料，尤其是无机薄膜和涂层的一种重要手段。用等离子辅助CVD，可在较低的温度下沉积，涂层均匀不剥落。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条