1) recurrent rapid thermal annealing
快速循环退火
1.
Amorphous Bi:YIG film was deposited on Si substrates by radio frequency (RF) magnetron sputtering and crystallized by recurrent rapid thermal annealing (RRTA) method.
对于用射频磁控溅射技术在Si基片上制备的Bi:YIG系薄膜,用快速循环退火方法对其进行晶化处理,研究了退火温度对Bi:YIG薄膜结晶状态和形貌的影响,以及退火气氛和循环周期对薄膜性能的影响。
2) Accelerated Cyclic Spheroidizing annealing
快速循环球化退火
3) Rapid (recurrent) thermal anneling
快速(循环)退火热处理
4) rapid thermal annealing
快速退火
1.
Effect of rapid thermal annealing on the structure and physical properties of Pt/BST/Pt capacitors
快速退火对Pt/BST/Pt电容器结构和性能的影响
2.
5)TiO_3 thin films were prepared by RF-magnetron sputtering method and crystallized by rapid thermal annealing and conventional furnace annealing.
实验表明:钛酸锶钡薄膜在500℃开始结晶,到700℃左右时结晶比较完善,晶化过程中没有出现择优取向;从表面形貌和X射线衍射图综合分析,快速退火的晶化效果要优于常规退火。
5) rapid annealing
快速退火
1.
The optimum rapid annealing process of high speed steel was given.
分析了退火温度、加热速度、冷却方式等因素对高速钢组织转变特点和结果的影响，提出了高速钢的快速退火最佳工艺，并对Ac1＋（10～20）℃退火与A14＋（10～20）℃快速退火工艺进行了对比。
2.
Compared to conventional annealing regime,rapid annealing by pulse-current heating can obviously improve the magne.
与常规退火工艺相比，脉冲电流加热快速退火，可在保持延性基本不变的情况下，明显改善合金的磁性；是获得非晶态Ｆｅ－Ｂ－Ｓｉ合金磁性优化与良好延性配合的有效途径之
3.
The experimental results showed that the complete transformation from fcc FePt to fct FePt was a-chieved by rapid annealing at 850℃ for 30s.
将化学自组装法制备的FePt薄膜进行快速退火,利用X射线衍射仪和振动样品磁强计对薄膜的结构和磁性进行了研究。
6) RTA
[英][,ɑ: ti: 'eɪ] [美]['ɑr 'ti 'e]
快速退火
1.
Preparation of Bi_4Ti_3O_(12) thin films with RTA method;
Bi_4Ti_3O_(12)薄膜及快速退火工艺的研究
2.
Effect of RTA on electrical character of Bi_4Ti_3O_(12) thin film;
快速退火工艺对钛酸铋薄膜电学性能影响的研究
3.
Application of RTA in Improving the Quality of Device Backside Alloy;
快速退火在提高芯片背金质量中的应用
补充资料：软化退火(见低温退火)
软化退火(见低温退火)
soft-annealing
rU0nhUO tUihUO软化退火(soft一annealing)见低温退火。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条